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Patterning
patterning
Pushing the single-exposure patterning capability of 0.33NA EUVL to its extreme...
Technology
Aman Desai
-
February 23, 2021
Imec demonstrates 18nm pitch line/space patterning with a high-chi directed self-assembly...
Technology
Aman Desai
-
February 19, 2021
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